
Silane Vaporization Chamber
CNSI
The silane vaporization chamber deposits a gas-phase monolayer of the chemical trimethylchlorosilane (silane) to serve as a counter-adhesion agent for glass or silicon substrates.
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CNSI
The silane vaporization chamber deposits a gas-phase monolayer of the chemical trimethylchlorosilane (silane) to serve as a counter-adhesion agent for glass or silicon substrates.

CNSI

CNSI

CNSI

CNSI
3D prints from the Stratasys F270 FDM printer are supported with the QSR support material. QSR is a dissolvable support material and can be dissolved in a hot bath of NaOH…

CNSI
Spin coaters can spread thin and flat substrates onto wafers very evenly using centrifugal force. A vacuum chuck holds wafers using suction as the spin coater spins.